High Temperature Stability
Continuous working temperature up to 1200 degrees Celsius with reliable thermal cycling performance for diffusion furnace operation.
Felix Glass Co., Limited manufactures large outer diameter fused silica quartz tubes from 99.999% high-purity SiO2 material. The tube is designed for high-temperature semiconductor wafer diffusion, oxidation processes and photovoltaic solar cell production lines where low contamination and dimensional stability are critical.
Continuous working temperature up to 1200 degrees Celsius with reliable thermal cycling performance for diffusion furnace operation.
5N SiO2 material supports low metal impurity control and helps reduce contamination risk for wafers and solar substrates.
Custom outer diameter, wall thickness, length, end polishing, branch tube forming and flange welding are available by drawing.
Final dimensions and tolerances should be confirmed according to furnace equipment drawings and working temperature conditions.
| SiO2 Purity | 99.999% 5N ultra-high purity | Outer Diameter | 100mm to 600mm custom range |
|---|---|---|---|
| Wall Thickness | 4mm to 20mm | Max Single Length | 2200mm |
| Thermal Shock | Rapid cold-hot switching resistance | Surface Treatment | Fire polished or mechanical fine polishing |
| Transmittance | UV-Vis-IR transmittance at least 93% | Impurity Control | PPb grade trace metal impurity control |
Each custom quartz tube can be checked for outer diameter, wall thickness, full length tolerance, bubble and scratch appearance, edge polishing quality, stress annealing result, impurity control and air tightness for welded modified structures.
Typical large outer diameter customization ranges from 100mm to 600mm. Larger or special geometry requirements should be evaluated by furnace drawing.
Yes. End forming, flange welding and branch tube processing can be reviewed according to assembly structure and working conditions.
Small trial orders are available, with MOQ 1 piece for drawing-based evaluation and prototype confirmation.